Coating Components - Planar Magnetron Sputtering Sources

BOC Edwards EPM75 and EPM100 planar magnetron sputtering sources are easy to fit and position in any vacuum system that has suitable 25 mm or 1 inch diameter holes. The offset leadthrough design allows easy adjustment of the radial source position. The EPM source design is well proven, having been used for many years in BOC Edwards sputtering systems.

Features and Benefits:

• Easy to install
  
• Integral NW25 leadthrough
  
• RF or DC operation
  
• Magnetron or diode sputtering
  
• Offset leadthrough enables variable radial positioning